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Flatness 30nm [Ultra-precision lap] [Mirror polishing]

Pursuing extreme flatness!

◆Flatness: Below 30nm◆ Our unique ultra-precision lapping process achieves extreme flatness. For example, a flatness of 30 nanometers can be achieved in a 50mm area. This technology is particularly useful for semiconductor device components, suction plates, precision stages, and other applications that require high levels of flatness. ex) Flatness: 0.1um (φ100 area)

• Company：ティ・ディ・シー
• Price：Other

• Other semiconductors